Niobium Sputtering Target

Material: RO4200-1,RO4210-2

Size:

Circular targets: Diameter 10mm up to 400mm x Thickness 2mm up to 28mm

Rectangular targets: Thickness 1mm up to 20.32mm x Width up to 800mm x Length up to 3000mm

Purity: ≥99.9% or 99.95%

Material Features：

high product density, good product compactness and uniform crystal grains;

Higher machining property;

Relative density of targets: over 99%, relative density of alloy: over 97%; grain size: less than 50um; thermal resistance of films: below 5%; welded rate with back plates: over 98%, film uniformity after target film formation: over 95%.

Conventional density: ≥8.5 g/cm3

For more information about niobium sputtering target please contact CS Titanium nb target manufacturer.

Niobium Sputtering Target Specifications

Niobium Sputtering Target Technological Process

Original Powder → HIP → Machine Process → Surface Treatment → Finished Products →Packaging → Inspection

Niobium Sputtering Target Application

Niobium sputtering target is mainly used in surface engineering materials, such as shipbuilding, chemical industry, liquid crystal display (LCD) and heat resistance, corrosion resistance and high conductivity coating industry, thin film solar industry, low radiation glass industry, flat panel display industry, optical coating industry, tools and decorative coating industry.

Another product you may be interested in: molybdenum sputtering target.

Niobium Sputtering Target Alloy Series

In addition to niobium sputtering target, we can also provide niobium-germanium alloy, niobium-tin alloy, niobium-zirconium alloy, niobium-hafnium alloy, niobium-titanium alloy, molybdenum-niobium alloy, aluminum-niobium alloy, lithium niobate alloy and other sputtering targets.

Features of niobium sputtering target

Exceptional Purity: The niobium sputtering targets from CS Titanium boast exceptional purity, ensuring minimal contamination and the production of high-quality, reliable products.

Outstanding Uniformity: These niobium sputtering targets offer outstanding uniformity, ensuring consistent sputtering rates and uniform thin film deposition, which is crucial for the performance of the end product.

High-Density Targets: The high-density niobium sputtering targets provided by CS Titanium ensure efficient sputtering, leading to enhanced film quality.

Wide Range of Shapes and Sizes: CS Titanium offers a wide range of shapes and sizes, providing flexibility and customization according to specific industrial needs.

Strong Bonding Properties: The niobium sputtering targets possess strong bonding properties, ensuring durability and longevity.

Enhanced Film Quality: The high-density niobium sputtering targets ensure efficient sputtering, leading to enhanced film quality, a critical factor in many applications.

Sustainable and Environmentally Friendly: CS Titanium's niobium sputtering targets are sustainable and environmentally friendly, aligning with the global push towards greener industrial practices.

Customized Niobium Sputtering Targets

Specialization: At CS Titanium, we specialize in producing customized Niobium Sputtering Targets for both commercial and research applications. Our expertise allows us to create tailored solutions that meet your specific requirements.

Custom Compositions: We can create custom compositions for new proprietary technologies. Our team works closely with you to understand your needs and develop the most suitable Niobium Sputtering Target composition.

Variety of Products: In addition to our Niobium Sputtering Targets, we offer a wide range of other magnetron sputtering targets, evaporation sources, and deposition materials. These are listed by material throughout our website for easy reference.

Quality Assurance: All our products, including our customized Niobium Sputtering Targets, undergo rigorous quality checks to ensure they meet our high standards and your expectations.

Expert Support: Our team of experts is always ready to provide support and advice, helping you choose the right materials and compositions for your needs.