GVM series vacuum coating machcine for ITO film

It has high conductivity, visible light transmittance and mechanical semiconductor film hardness and good stability.

Operational principle:
Taking use of different target basement structure and different target materials, the machine will coat one or more layer of nano film on substrate surface ,generating high and low resistance ITO film.
Application filed:
Mainly applied to LCD display, plasma display, electroluminescent display, touch screen, solar cells, flexible circuit boards and other conductive glass, electronic instrument and other transparent and conductive films. It has high conductivity, visible light transmittance and mechanical semiconductor film hardness and good stability.
Main feature:
1. traditional vertical or efficient horizontal structure, multi vacuum chambers and sputtering chamber structure with the vacuum lock isolation, meet the different needs;
2. Adopting new model of planar target, columnar target, rectangular target, twin magnetron target sputtering technology, improve the effect of coating and efficiency;
3. Equipped high precision magnetic control power supply, gas flow, speed control, and high degree of automation. Simple operation.
4. Work piece rack adopt wheel roller structure, can set up automatic positive &negative rotation, adjust speed and good uniformity;
5. High-speed deposition rate and small temperature rise, avoid destroy for the tagets ;
Basic outfit:
1. Chamber structure: vertical ,horizontal structure and multi-chamber structure ,all stainless steel material , the vacuum chamber effective diameter of 800mm-2000mm, water-cooled double sandwich structure, inside stainless steel plate with a plug-in anti-fouling, easy to clean and operation;
2. Vacuum system: mechanical pumps, rotary vane pumps, roots pumps, molecular pumps, cryogenic pump , vacuum diffusion pump with cold trap, pre-pump is oil-free vacuum pump, with stainless steel and valves;
3. Coating system: adopting 2- 8 sets of planar target or cylinder target, DC magnetron sputtering, DC and RF magnetron sputtering, HDAP coating
4. Pneumatic system: adopting 1-4 road gas flow meter and flow display control;
5. Control system: color touch screen, PLC, automatic and manual control can be converted any time; real-time display detailed parameters, automatic control the entire production process, automatic storage process parameters. The main electrical components Schneider and other famous brands;
6. Security system: Set abnormal sound and light alarm devices for water, electricity, gas, perform the appropriate protection procedures;
7.auxiliary pump system: adopting a rapid circulation of low temperature steam trap;
8. The heating system: adopting tubular heating body, substrate temperature can reach 350 degrees;
9.Equipped with multiple target source according to customer requirements;